Thin-film deposition

Thin-film deposition is any technique for depositing (controlled deposition) of thin films of material unto a substrate (or unto previously deposited layers), especially in the manufacture of semiconductors and other electronic components.

Related terms: sputtering, vacuum deposition, vapor deposition, MEMs (microelectromechanical devices), nanotechnology

(see Materials science)

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External links

(A Google search on "thin film deposition" leads to 25,000 links, mostly for related equipment, textbooks, and university courses; very little of a tutorial or explanatory nature)

University of Wisconsin: Laboratory for Thin Film Deposition (http://www.engr.wisc.edu/centers/ltfd/)
Cambridge University Facilities (http://www.msm.cam.ac.uk/dmg/facilities/deposition/)
Thin Film Deposition Processes and Techniques (http://www.williamandrew.com/titles/1153.html) (A textbook summary and order form)
ORNL (http://www.ornl.gov/sci/fed/Technology/tsa/tfd/tfd.html) (Oak Ridge National Laboratory)
[1] (http://www.physics.ucf.edu/~lc/thin-film.html)

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